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TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
描述
無描述
配置
SIO-ETC
OEM 代工型號說明
The UNITY® IIe 85 is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, including IIe, M, and Me, which were designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe 85 delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is known for its high throughput, compact design, and lower CoO. Additionally, it offers ease of maintenance and a Flow Control System (Me). The UNITY® IIe is available in 84, 85 and 88 models.
文檔

無文檔

類別
Dry / Plasma Etch

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

127357


晶圓尺寸:

8"/200mm


年份:

1997


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

TEL / TOKYO ELECTRON

UNITY IIE 855 PP

verified-listing-icon
已驗證
類別
Dry / Plasma Etch
上次驗證: 超過60天前
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關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

127357


晶圓尺寸:

8"/200mm


年份:

1997


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
SIO-ETC
OEM 代工型號說明
The UNITY® IIe 85 is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, including IIe, M, and Me, which were designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe 85 delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is known for its high throughput, compact design, and lower CoO. Additionally, it offers ease of maintenance and a Flow Control System (Me). The UNITY® IIe is available in 84, 85 and 88 models.
文檔

無文檔