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TEL / TOKYO ELECTRON MB2-730
    描述
    無描述
    配置
    2 Chamber System (Wsix CVD ) Hardware Configuration: - 3-Chamber(L/R/C) System - DCS-Wsix process specification(HT) - Dry pump for both loadlock Module - 2-Loadlock , 2-Cassette Module - Turbo pump and dry pump for transfer and process chambers - Display with touch panel at clean room side. - Monitor with keyboard and mouse at maintenance area - Gas line config - one line splitting to two chambers - 2 MKS baratron for process chamber (5Torr and 50mTorr) - Gas WF6 5sccm , DCS 500sccm , Ar 200sccm (2Ea) , - Ar(backside Ar) 100sccm , ClF3 500sccm - AC208V / 150Hz / 3-PHASE / 100kVA breaker - Water Pressure 5 kgfcm2 max - Water Flow 33 litre/min - Water Temperature 15 - 25 degC - General Exhaust Volume 3.2 m3/min - TEL Secondary breaker box 1Ea - BOC DE150 GRC Scrubber - Mainframe of Software Version : V4-8gL
    OEM 代工型號說明
    The MB2-730 is a highly reliable system designed for advanced process capability in tungsten and tungsten silicide CVD applications. It has been in production for 5 years and has proven to be a dominant tool in the CVD tungsten silicide market, with a market share of over 70%. This system is known for its reliability and advanced process capabilities, making it a popular choice for those in the industry.
    文檔

    無文檔

    TEL / TOKYO ELECTRON

    MB2-730

    verified-listing-icon

    已驗證

    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    41303


    晶圓尺寸:

    8"/200mm


    年份:

    1997


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON MB2-730

    TEL / TOKYO ELECTRON

    MB2-730

    Dry / Plasma Etch
    年份: 2002條件: 二手
    上次驗證超過60天前

    TEL / TOKYO ELECTRON

    MB2-730

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-feb6ea083dc04dba84a030542019ce34-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4463/feb6ea083dc04dba84a030542019ce34/2b61d3fe4d4047c6ab270fcc83eb9912_c8e3b1e3eade41019afbcc1ef290167f45005c_mw.jpeg
    listing-photo-feb6ea083dc04dba84a030542019ce34-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4463/feb6ea083dc04dba84a030542019ce34/220091aa928549a9a18f77e7d1d1d2d6_f88053a5bd5e40a9b9894594aa907e4e45005c_mw.jpeg
    listing-photo-feb6ea083dc04dba84a030542019ce34-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4463/feb6ea083dc04dba84a030542019ce34/6d8b5e66103e4a8080f1fe8bc4c83171_1529b06c764c478e9f56a80d7278e53a45005c_mw.jpeg
    listing-photo-feb6ea083dc04dba84a030542019ce34-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4463/feb6ea083dc04dba84a030542019ce34/1f9407419d00464e9e2859f2c0287b38_299f40a55c934e25b32ae61a3bd8534d45005c_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    41303


    晶圓尺寸:

    8"/200mm


    年份:

    1997


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    2 Chamber System (Wsix CVD ) Hardware Configuration: - 3-Chamber(L/R/C) System - DCS-Wsix process specification(HT) - Dry pump for both loadlock Module - 2-Loadlock , 2-Cassette Module - Turbo pump and dry pump for transfer and process chambers - Display with touch panel at clean room side. - Monitor with keyboard and mouse at maintenance area - Gas line config - one line splitting to two chambers - 2 MKS baratron for process chamber (5Torr and 50mTorr) - Gas WF6 5sccm , DCS 500sccm , Ar 200sccm (2Ea) , - Ar(backside Ar) 100sccm , ClF3 500sccm - AC208V / 150Hz / 3-PHASE / 100kVA breaker - Water Pressure 5 kgfcm2 max - Water Flow 33 litre/min - Water Temperature 15 - 25 degC - General Exhaust Volume 3.2 m3/min - TEL Secondary breaker box 1Ea - BOC DE150 GRC Scrubber - Mainframe of Software Version : V4-8gL
    OEM 代工型號說明
    The MB2-730 is a highly reliable system designed for advanced process capability in tungsten and tungsten silicide CVD applications. It has been in production for 5 years and has proven to be a dominant tool in the CVD tungsten silicide market, with a market share of over 70%. This system is known for its reliability and advanced process capabilities, making it a popular choice for those in the industry.
    文檔

    無文檔

    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON MB2-730

    TEL / TOKYO ELECTRON

    MB2-730

    Dry / Plasma Etch年份: 2002條件: 二手上次驗證:超過60天前
    TEL / TOKYO ELECTRON MB2-730

    TEL / TOKYO ELECTRON

    MB2-730

    Dry / Plasma Etch年份: 1998條件: 二手上次驗證:超過60天前
    TEL / TOKYO ELECTRON MB2-730

    TEL / TOKYO ELECTRON

    MB2-730

    Dry / Plasma Etch年份: 2002條件: 二手上次驗證:超過60天前