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STS PRO ICP

描述

ICP Etcher Complete

配置

Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.

OEM 代工型號說明

未提供

文檔

無文檔

STS

PRO ICP

verified-listing-icon

已驗證

類別

Dry / Plasma Etch

上次驗證: 4 天前

關鍵商品詳情

條件:

Used

作業狀態:

未知

產品編號:

145586

晶圓尺寸:

未知

年份:

2007

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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年份: 0條件: 二手

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年份: 0條件: 翻新的

上次驗證超過60天前

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verified-listing-icon

已驗證

類別

Dry / Plasma Etch

上次驗證: 4 天前

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關鍵商品詳情

條件:

Used

作業狀態:

未知

產品編號:

145586

晶圓尺寸:

未知

年份:

2007

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

描述

ICP Etcher Complete

配置

Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.

OEM 代工型號說明

未提供

文檔

無文檔

類似上架商品

STS PRO ICP

STS

PRO ICP

Dry / Plasma Etch年份: 2007條件: 二手上次驗證:4 天前

STS PRO ICP

STS

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Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前

STS PRO ICP

STS

PRO ICP

Dry / Plasma Etch年份: 0條件: 翻新的上次驗證:超過60天前