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PLASMATHERM Vision 320
    描述
    Mark II No missing parts PLC broken down - PLC/SW issues Vacuum pump, turbo pump, chillers
    配置
    Gasses/Process: CF4, CHF3, N2, O2, Ar, RIE
    OEM 代工型號說明
    The Vision 320 RIE provides etch capability for R&D, prototyping, and low volume production. This parallel-plate capacitance based systems is found in applications that include fundamental material studies, surface modification, semiconductor device fabrication, and failure analysis involving delayering. This system, found in both academic and industrial environments, is a result of their small footprint along with robust construction that focuses on ease of use and low maintenance. The Vision systems satisfy the high reliability requirements for critical applications such as delayering where production is dependent on constant input from the Failure Analysis department. Being outside of the fabrication process, means that the system must have turnkey operation for non-etch process oriented engineers.
    文檔

    無文檔

    類別
    Dry / Plasma Etch

    上次驗證: 超過30天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Idle


    產品編號:

    128487


    晶圓尺寸:

    8"/200mm


    年份:

    2008


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    PLASMATHERM

    Vision 320

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過30天前
    listing-photo-2420925de0c04d2c9bb50b6e0804daf8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/89162/2420925de0c04d2c9bb50b6e0804daf8/71c1a8086c734c5aab4e05e609fa490c_c8967f9399834c42b7974a508b1cf08845005c_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Idle


    產品編號:

    128487


    晶圓尺寸:

    8"/200mm


    年份:

    2008


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Mark II No missing parts PLC broken down - PLC/SW issues Vacuum pump, turbo pump, chillers
    配置
    Gasses/Process: CF4, CHF3, N2, O2, Ar, RIE
    OEM 代工型號說明
    The Vision 320 RIE provides etch capability for R&D, prototyping, and low volume production. This parallel-plate capacitance based systems is found in applications that include fundamental material studies, surface modification, semiconductor device fabrication, and failure analysis involving delayering. This system, found in both academic and industrial environments, is a result of their small footprint along with robust construction that focuses on ease of use and low maintenance. The Vision systems satisfy the high reliability requirements for critical applications such as delayering where production is dependent on constant input from the Failure Analysis department. Being outside of the fabrication process, means that the system must have turnkey operation for non-etch process oriented engineers.
    文檔

    無文檔