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描述
無描述配置
Model: Plasmalab 100 ICP - Inductive Coupled Plasma Source (ICP380) - Max wafer size: 8"/200m diameter (8" platen) - X-20 PLC Controller - New Windows 10 PC - Cryo Table Option Equipped (-150C to +400C) - Mechanical Wafer Clamping - Backside Helium Cooling - Load-locked single chamber (ICP) - Alcatel Maglev Turbo Pump (Chamber) - Alcatel Turbo Pump (Load Lock) - Alcatel ACT Controller - Computer (see note below) - LCD Monitor, Keyboard, and Mouse - Load Lock Rough Pump - Chamber Rough PumpOEM 代工型號說明
Etching System文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled
產品編號:
113484
晶圓尺寸:
8"/200mm
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
100 180 ICP
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled
產品編號:
113484
晶圓尺寸:
8"/200mm
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Model: Plasmalab 100 ICP - Inductive Coupled Plasma Source (ICP380) - Max wafer size: 8"/200m diameter (8" platen) - X-20 PLC Controller - New Windows 10 PC - Cryo Table Option Equipped (-150C to +400C) - Mechanical Wafer Clamping - Backside Helium Cooling - Load-locked single chamber (ICP) - Alcatel Maglev Turbo Pump (Chamber) - Alcatel Turbo Pump (Load Lock) - Alcatel ACT Controller - Computer (see note below) - LCD Monitor, Keyboard, and Mouse - Load Lock Rough Pump - Chamber Rough PumpOEM 代工型號說明
Etching System文檔
無文檔