描述
CVD Chemical Vapor Deposition配置
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM 代工型號說明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.文檔
無文檔
MATTSON
ASPEN II
已驗證
類別
Dry / Plasma Etch
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
66491
晶圓尺寸:
6"/150mm
年份:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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MATTSON
ASPEN II
類別
Dry / Plasma Etch
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
66491
晶圓尺寸:
6"/150mm
年份:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
CVD Chemical Vapor Deposition配置
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM 代工型號說明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.文檔
無文檔