We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 閱讀詳情
描述
CVD Chemical Vapor Deposition配置
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM 代工型號說明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.文檔
無文檔
類似上架商品
查看全部
MATTSON
ASPEN II
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
66491
晶圓尺寸:
6"/150mm
年份:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
CVD Chemical Vapor Deposition配置
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM 代工型號說明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.文檔
無文檔