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MATTSON ASPEN II
    描述
    CVD Chemical Vapor Deposition
    配置
    CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30
    OEM 代工型號說明
    MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.
    文檔

    無文檔

    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    66491


    晶圓尺寸:

    6"/150mm


    年份:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    MATTSON

    ASPEN II

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-00c32a64e9f0400891106ed3f884d920-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/50071/00c32a64e9f0400891106ed3f884d920/d663755934c34a7e9d087aba2f975c2b_74f91aa699944cfd8894a1fca6dcfc231201a_mw.jpeg
    listing-photo-00c32a64e9f0400891106ed3f884d920-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/50071/00c32a64e9f0400891106ed3f884d920/5f6f0337c7074944b8ffa54cf0d9ade6_16aab9fab17e41f88a9262d69fc8ad161201a_mw.jpeg
    listing-photo-00c32a64e9f0400891106ed3f884d920-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/50071/00c32a64e9f0400891106ed3f884d920/9b981290d6b244cb9345c8be32c3f2a1_ace036d7910e468c8fd3afacc0b1228d1201a_mw.jpeg
    listing-photo-00c32a64e9f0400891106ed3f884d920-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/50071/00c32a64e9f0400891106ed3f884d920/57f522844f354be7a707be0ceed9c119_c4e76fcbde15438cbfe94696b24e2e381201a_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    66491


    晶圓尺寸:

    6"/150mm


    年份:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    CVD Chemical Vapor Deposition
    配置
    CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30
    OEM 代工型號說明
    MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.
    文檔

    無文檔

    類似上架商品
    查看全部