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LAM RESEARCH CORPORATION RAINBOW 4520XL
  • LAM RESEARCH CORPORATION RAINBOW 4520XL
  • LAM RESEARCH CORPORATION RAINBOW 4520XL
  • LAM RESEARCH CORPORATION RAINBOW 4520XL
描述
無描述
配置
無配置
OEM 代工型號說明
The Rainbow 4520XL is part of Lam Research’s Rainbow series of etch systems. This series addresses processes for wafers up to 200mm and feature sizes as small as 0.35 micron. The Rainbow product line includes the 4400, 4500, 4600, and 4700 series for etching polysilicon, oxide, aluminum, and tungsten films. These systems offer improved etch capability, reliability, and performance through unique features such as a patented wafer handling system and a proprietary source for generating stable plasma.
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PREFERRED
 
SELLER
類別
Dry / Plasma Etch

上次驗證: 超過60天前

Buyer pays 12% premium of final sale price
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

97824


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

LAM RESEARCH CORPORATION

RAINBOW 4520XL

verified-listing-icon
已驗證
類別
Dry / Plasma Etch
上次驗證: 超過60天前
listing-photo-c279302746f64cd087e3f420aec58ccf-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Buyer pays 12% premium of final sale price
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

97824


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
無配置
OEM 代工型號說明
The Rainbow 4520XL is part of Lam Research’s Rainbow series of etch systems. This series addresses processes for wafers up to 200mm and feature sizes as small as 0.35 micron. The Rainbow product line includes the 4400, 4500, 4600, and 4700 series for etching polysilicon, oxide, aluminum, and tungsten films. These systems offer improved etch capability, reliability, and performance through unique features such as a patented wafer handling system and a proprietary source for generating stable plasma.
文檔

無文檔