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LAM RESEARCH CORPORATION 2300 SYNDION-C
    描述
    無描述
    配置
    Wafer Etching
    OEM 代工型號說明
    2300 Syndion C is a product in the Syndion etch product family that provides the layer-by-layer process flexibility and control needed for cost-efficient via etch for TSV applications. It offers high process flexibility, superior profile control, and excellent uniformity to address multiple TSV etch applications. It also has a low cost of ownership due to high etch rates, excellent repeatability, and in-situ etching of multiple materials in the TSV stack. Both conventional single-step etch and rapidly alternating process (RAP) are supported. Key applications include TSV for CMOS 3D IC and TSV for image sensors.
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    Dry / Plasma Etch

    上次驗證: 超過60天前

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    條件:

    Used


    作業狀態:

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    產品編號:

    129944


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
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    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    LAM RESEARCH CORPORATION 2300 SYNDION-C

    LAM RESEARCH CORPORATION

    2300 SYNDION-C

    Dry / Plasma Etch
    年份: 0條件: 二手
    上次驗證超過60天前

    LAM RESEARCH CORPORATION

    2300 SYNDION-C

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-5357404763da437794552b97917371d5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    129944


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Wafer Etching
    OEM 代工型號說明
    2300 Syndion C is a product in the Syndion etch product family that provides the layer-by-layer process flexibility and control needed for cost-efficient via etch for TSV applications. It offers high process flexibility, superior profile control, and excellent uniformity to address multiple TSV etch applications. It also has a low cost of ownership due to high etch rates, excellent repeatability, and in-situ etching of multiple materials in the TSV stack. Both conventional single-step etch and rapidly alternating process (RAP) are supported. Key applications include TSV for CMOS 3D IC and TSV for image sensors.
    文檔

    無文檔

    類似上架商品
    查看全部
    LAM RESEARCH CORPORATION 2300 SYNDION-C

    LAM RESEARCH CORPORATION

    2300 SYNDION-C

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前