描述
無描述配置
無配置OEM 代工型號說明
The 2300 Kiyo E is part of Lam’s Kiyo product family, which delivers high-performance capabilities to precisely and consistently form conductive features with high productivity. The Kiyo E series is designed to address the challenges of the semiconductor industry, such as processing smaller features, new materials, and new transistor structures on the wafer. It offers superior uniformity and repeatability, enabled by a symmetrical chamber design, industry-leading electrostatic chuck technology, and independent process tuning features. Additionally, it has high productivity with low defectivity on multi-film stacks, enabled by in-situ etch capability, continuous plasma, and advanced waferless auto-clean technology. The Kiyo E series also offers improved critical dimension uniformity using proprietary Hydra technology that corrects for incoming patterning variability and atomic-scale variability control with production-worthy throughput enabled by plasma-enhanced ALE capability. The product is upgradable for low cost of ownership over several device generations.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 11 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
142041
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 KIYO E
類別
Dry / Plasma Etch
上次驗證: 11 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
142041
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The 2300 Kiyo E is part of Lam’s Kiyo product family, which delivers high-performance capabilities to precisely and consistently form conductive features with high productivity. The Kiyo E series is designed to address the challenges of the semiconductor industry, such as processing smaller features, new materials, and new transistor structures on the wafer. It offers superior uniformity and repeatability, enabled by a symmetrical chamber design, industry-leading electrostatic chuck technology, and independent process tuning features. Additionally, it has high productivity with low defectivity on multi-film stacks, enabled by in-situ etch capability, continuous plasma, and advanced waferless auto-clean technology. The Kiyo E series also offers improved critical dimension uniformity using proprietary Hydra technology that corrects for incoming patterning variability and atomic-scale variability control with production-worthy throughput enabled by plasma-enhanced ALE capability. The product is upgradable for low cost of ownership over several device generations.文檔
無文檔