描述
Wafer Edge Cleaning - Plasma配置
無配置OEM 代工型號說明
The 2300 Coronus is a plasma-based bevel clean system developed by Lam Research. It removes yield-limiting defect sources from the wafer edge, maximizing yield. The system combines plasma cleaning with proprietary confinement technology to protect the die area. It is flexible and robust, allowing for removal of different materials within the same chamber for a wide range of wafer cleaning applications. The Coronus system incorporates Lam Research’s Dynamic Alignment technology for highly accurate wafer placement and encroachment control.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
91745
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 CORONUS
類別
Dry / Plasma Etch
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
91745
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Wafer Edge Cleaning - Plasma配置
無配置OEM 代工型號說明
The 2300 Coronus is a plasma-based bevel clean system developed by Lam Research. It removes yield-limiting defect sources from the wafer edge, maximizing yield. The system combines plasma cleaning with proprietary confinement technology to protect the die area. It is flexible and robust, allowing for removal of different materials within the same chamber for a wide range of wafer cleaning applications. The Coronus system incorporates Lam Research’s Dynamic Alignment technology for highly accurate wafer placement and encroachment control.文檔
無文檔