描述

Heater Type : Susceptor Chamber Type : DLH Process Type : TEOS Ⅲ. Missing Part List controller box#1 SBC controller box#2+15V PS OPTO#2 Chamber B C. M gauge AC BOX CB4 LAMP/MAG A

配置

無配置

OEM 代工型號說明

The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.