描述
無描述配置
無配置OEM 代工型號說明
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.文檔
無文檔
APPLIED MATERIALS (AMAT)
CENTURA IPS
已驗證
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
63390
晶圓尺寸:
未知
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA IPS
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
63390
晶圓尺寸:
未知
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.文檔
無文檔