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APPLIED MATERIALS (AMAT) CENTURA HART AP
    描述
    1/1/26
    配置
    無配置
    OEM 代工型號說明
    Centura HART AP is likely designed to provide high-performance, precise etching for high aspect ratio trench applications. The system may also incorporate various features to ensure process control, uniformity, and efficiency, as these are typical qualities sought in etching equipment. "High Aspect Ratio Trench" refers to a trench (or hole) in a material that is much deeper than it is wide. The aspect ratio is the ratio of the depth of the trench to its width. In the context of semiconductor manufacturing, such as the creation of DRAM (dynamic random-access memory) cells, these high aspect ratio trenches are critical. These trenches are used to store charge, with the amount of charge representing the 0s and 1s of digital data. The higher the aspect ratio, the more charge the trench can store, which can help increase the storage capacity of the memory cell.
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    已驗證

    類別
    Dry / Plasma Etch

    上次驗證: 28 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    148128


    晶圓尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
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    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch
    年份: 0條件: 二手
    上次驗證28 天前

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 28 天前
    listing-photo-d115fed2ac5243fb9b715a9fac92b990-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    148128


    晶圓尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    1/1/26
    配置
    無配置
    OEM 代工型號說明
    Centura HART AP is likely designed to provide high-performance, precise etching for high aspect ratio trench applications. The system may also incorporate various features to ensure process control, uniformity, and efficiency, as these are typical qualities sought in etching equipment. "High Aspect Ratio Trench" refers to a trench (or hole) in a material that is much deeper than it is wide. The aspect ratio is the ratio of the depth of the trench to its width. In the context of semiconductor manufacturing, such as the creation of DRAM (dynamic random-access memory) cells, these high aspect ratio trenches are critical. These trenches are used to store charge, with the amount of charge representing the 0s and 1s of digital data. The higher the aspect ratio, the more charge the trench can store, which can help increase the storage capacity of the memory cell.
    文檔

    無文檔

    類似上架商品
    查看全部
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:28 天前
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:28 天前
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:28 天前