
描述
Mainframe: 300mm配置
300mm DPS Metal chamber with 200mm ESCOEM 代工型號說明
The CENTURA AP DPS II delivers high-productivity silicon, metal, and dielectric etch. Etching is one of the most critical yet challenging of semiconductor production operations. Metal Etch文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
122819
晶圓尺寸:
8"/200mm
年份:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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查看全部APPLIED MATERIALS (AMAT)
CENTURA AP DPS II
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
122819
晶圓尺寸:
8"/200mm
年份:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Mainframe: 300mm配置
300mm DPS Metal chamber with 200mm ESCOEM 代工型號說明
The CENTURA AP DPS II delivers high-productivity silicon, metal, and dielectric etch. Etching is one of the most critical yet challenging of semiconductor production operations. Metal Etch文檔
無文檔