描述
無描述配置
Components: 1 x Orienter 1 x MxP Poly 2 x MxP+ Poly 1 x eMxP+ Software Version: 4.9_15 ESC Type: Polymide Endpoint: Monochromator Gases Used: NF3 CH3F CL2 HBr CHF3 Ar CF4 O2 N2 C4F8 CO Mass Flow Controllers (MFCs): 32 Digital MFCs (14-Unit or 18-Horiba) Robot: HP Robot Dry Pumps: 4 x IQDP80 2 x IQDP80/WSU151 Chillers: 5 x Neslab 150 unitsOEM 代工型號說明
The AMAT / APPLIED MATERIALS Centura 5200 is an Etchers & Ashers system. The centura 5200 can be used with 8” wafer size and oxidation etchers size is also 8”. The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 今日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
147163
晶圓尺寸:
未知
年份:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA 5200
類別
Dry / Plasma Etch
上次驗證: 今日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
147163
晶圓尺寸:
未知
年份:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Components: 1 x Orienter 1 x MxP Poly 2 x MxP+ Poly 1 x eMxP+ Software Version: 4.9_15 ESC Type: Polymide Endpoint: Monochromator Gases Used: NF3 CH3F CL2 HBr CHF3 Ar CF4 O2 N2 C4F8 CO Mass Flow Controllers (MFCs): 32 Digital MFCs (14-Unit or 18-Horiba) Robot: HP Robot Dry Pumps: 4 x IQDP80 2 x IQDP80/WSU151 Chillers: 5 x Neslab 150 unitsOEM 代工型號說明
The AMAT / APPLIED MATERIALS Centura 5200 is an Etchers & Ashers system. The centura 5200 can be used with 8” wafer size and oxidation etchers size is also 8”. The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.文檔
無文檔