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TEL / TOKYO ELECTRON TELFORMULA
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
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    TEL / TOKYO ELECTRON

    TELFORMULA

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    類別

    Thermal Processing
    上次驗證: 超過60天前
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    條件:

    Refurbished


    作業狀態:

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    產品編號:

    70806


    晶圓尺寸:

    未知


    年份:

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    TEL / TOKYO ELECTRON TELFORMULA
    TEL / TOKYO ELECTRONTELFORMULAThermal Processing
    年份: 0條件: 二手
    上次驗證4 天前

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon

    已驗證

    類別

    Thermal Processing
    上次驗證: 超過60天前
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    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    70806


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    文檔
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    TEL / TOKYO ELECTRON TELFORMULA
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    TEL / TOKYO ELECTRON TELFORMULA
    TEL / TOKYO ELECTRON
    TELFORMULA
    Thermal Processing年份: 0條件: 二手上次驗證: 4 天前
    TEL / TOKYO ELECTRON TELFORMULA
    TEL / TOKYO ELECTRON
    TELFORMULA
    Thermal Processing年份: 0條件: 二手上次驗證: 4 天前