描述
CVD system配置
Known issues: Not included: Chamber Gate Valve; MFC7; (Qty 2) LM-Arm End Effector Pads (Rear); (Qty 2) Chamber APC Valve; LM-Robot (Front-End); (Qty 3) Process Kit; (Qty 2) LM-Arm End Effector Pads (Front); Chemgaurd ClF3 Cabinet; (Qty 3) Chamber Trap Trias Mainframe (Qty 3) EXII Chamber FOUP Factory Interface Yaskawa Dual Arm Handler Process: TiN Software Version: V5 750R1 CIM: SECS/GEMOEM 代工型號說明
Triase+™ Ti/TiN is a 300mm single-wafer metal CVD system for high step coverage Ti/TiN film formation using TiCl4.文檔
無文檔
類別
Deposition
上次驗證: 5 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
154819
晶圓尺寸:
12"/300mm
年份:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
TRIASe+ Ti/TiN
類別
Deposition
上次驗證: 5 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
154819
晶圓尺寸:
12"/300mm
年份:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
CVD system配置
Known issues: Not included: Chamber Gate Valve; MFC7; (Qty 2) LM-Arm End Effector Pads (Rear); (Qty 2) Chamber APC Valve; LM-Robot (Front-End); (Qty 3) Process Kit; (Qty 2) LM-Arm End Effector Pads (Front); Chemgaurd ClF3 Cabinet; (Qty 3) Chamber Trap Trias Mainframe (Qty 3) EXII Chamber FOUP Factory Interface Yaskawa Dual Arm Handler Process: TiN Software Version: V5 750R1 CIM: SECS/GEMOEM 代工型號說明
Triase+™ Ti/TiN is a 300mm single-wafer metal CVD system for high step coverage Ti/TiN film formation using TiCl4.文檔
無文檔