描述
2 Chamber WxZ, 1 Orienter/degas, Preclean 23.11.08 Not sure if there is Pre Clean, robot is HP+配置
2 Chamber WxZ, 1 Orienter/degas, Preclean 23.11.08 Not sure if there is Pre Clean, robot is HP+OEM 代工型號說明
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.文檔
無文檔
類別
Deposition
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105344
晶圓尺寸:
8"/200mm
年份:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
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APPLIED MATERIALS (AMAT)
CENTURA MCVD
類別
Deposition
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105344
晶圓尺寸:
8"/200mm
年份:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
2 Chamber WxZ, 1 Orienter/degas, Preclean 23.11.08 Not sure if there is Pre Clean, robot is HP+配置
2 Chamber WxZ, 1 Orienter/degas, Preclean 23.11.08 Not sure if there is Pre Clean, robot is HP+OEM 代工型號說明
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.文檔
無文檔