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描述
23.11.08 Not sure if there is Pre Clean, robot is HP+配置
2 Chamber WxZ, 1 Orienter/degas, PrecleanOEM 代工型號說明
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.文檔
無文檔
類別
Deposition
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
121156
晶圓尺寸:
8"/200mm
年份:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA MCVD
類別
Deposition
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
121156
晶圓尺寸:
8"/200mm
年份:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
23.11.08 Not sure if there is Pre Clean, robot is HP+配置
2 Chamber WxZ, 1 Orienter/degas, PrecleanOEM 代工型號說明
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.文檔
無文檔