概述

The Puma 9150 is a Laser Imaging Patterned Wafer Inspection System developed by KLA Corporation. It combines UV illumination optics with multiple high-speed imaging sensors to offer a range of optical modes for critical defect detection inline on patterned, production wafers. The Puma 9150 provides enhanced capture of low profile, large area defects, such as underpolish and slurry residues from copper CMP. It also improves darkfield defect capture in etch applications, such as microbridges and partially or fully blocked vias.