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KLA 2800
  • KLA 2800
  • KLA 2800
  • KLA 2800
描述
KLA2800 Lamp
配置
無配置
OEM 代工型號說明
The 2800 Series is a next-generation broadband DUV/UV/VIS patterned wafer inspection platform for sub-65-nm design rule development and production. It delivers maximum sensitivity, 2X better throughput than previous-generation DUV tools, and has a roadmap that extends to 45-nm and beyond design rules. It offers an array of optical modes and accelerates time to results with advanced binning and realtime defect classification. The 2800 Series is suited for unique applications such as Photo Cell Monitoring, Process Window Qualification, and Micro After-Develop Inspection. It complements the Puma 9000 Series darkfield platform and eS3x electron-beam inspection system to enable a comprehensive defect inspection strategy.
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已驗證

類別
Defect Inspection

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

101300


晶圓尺寸:

12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

2800

verified-listing-icon
已驗證
類別
Defect Inspection
上次驗證: 超過60天前
listing-photo-7b4aeb4b4ac040f7a5eb3f9fc9d59386-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

101300


晶圓尺寸:

12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
KLA2800 Lamp
配置
無配置
OEM 代工型號說明
The 2800 Series is a next-generation broadband DUV/UV/VIS patterned wafer inspection platform for sub-65-nm design rule development and production. It delivers maximum sensitivity, 2X better throughput than previous-generation DUV tools, and has a roadmap that extends to 45-nm and beyond design rules. It offers an array of optical modes and accelerates time to results with advanced binning and realtime defect classification. The 2800 Series is suited for unique applications such as Photo Cell Monitoring, Process Window Qualification, and Micro After-Develop Inspection. It complements the Puma 9000 Series darkfield platform and eS3x electron-beam inspection system to enable a comprehensive defect inspection strategy.
文檔

無文檔