描述
Film Thickness Measurement配置
[Power-on] 2port(TDK), Yaskawa(Aligner, Robot) / *Need to check Fine Z-stage focus(Fail).OEM 代工型號說明
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.文檔
無文檔
KLA
SPECTRAFX 200
已驗證
類別
Defect Inspection
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
95294
晶圓尺寸:
12"/300mm
年份:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
SPECTRAFX 200
已驗證
類別
Defect Inspection
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
95294
晶圓尺寸:
12"/300mm
年份:
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Film Thickness Measurement配置
[Power-on] 2port(TDK), Yaskawa(Aligner, Robot) / *Need to check Fine Z-stage focus(Fail).OEM 代工型號說明
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.文檔
無文檔