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KLA AIT II
    描述
    Taken Offline in July
    配置
    6"
    OEM 代工型號說明
    The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.
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    KLA

    AIT II

    verified-listing-icon

    已驗證

    類別
    Defect Inspection

    上次驗證: 28 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Deinstalled


    產品編號:

    100099


    晶圓尺寸:

    6"/150mm


    年份:

    2000

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    KLA AIT II

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    Defect Inspection
    年份: 0條件: 二手
    上次驗證超過60天前

    KLA

    AIT II

    verified-listing-icon
    已驗證
    類別
    Defect Inspection
    上次驗證: 28 天前
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Deinstalled


    產品編號:

    100099


    晶圓尺寸:

    6"/150mm


    年份:

    2000


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Taken Offline in July
    配置
    6"
    OEM 代工型號說明
    The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.
    文檔

    無文檔

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