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COMPASS 200

概述

Applied Compass, a patterned wafer inspection systems designed for process monitoring down to the 100nm technology node. Critical defects are detected at production worthy throughput with OMNIView™, a multi-perspective laser scanning technology ensuring robust detection of a wide variety of defect types across all process layers. Compass is a high performance production tool and has the technology required for fast introduction of new technologies to volume production.

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