描述
PHOTO MARK_2 DV17(S-79)配置
無配置OEM 代工型號說明
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.文檔
無文檔
TEL / TOKYO ELECTRON
MARK II
已驗證
類別
Coaters & Developers
上次驗證: 25 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
117335
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部
TEL / TOKYO ELECTRON
MARK II
類別
Coaters & Developers
上次驗證: 25 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
117335
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
PHOTO MARK_2 DV17(S-79)配置
無配置OEM 代工型號說明
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.文檔
無文檔