描述
Single Block 3D配置
Photo Resist Develop SystemOEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
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TEL / TOKYO ELECTRON
MARK 7
已驗證
類別
Coaters & Developers
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
59242
晶圓尺寸:
8"/200mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
MARK 7
類別
Coaters & Developers
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
59242
晶圓尺寸:
8"/200mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Single Block 3D配置
Photo Resist Develop SystemOEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
無文檔