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TEL / TOKYO ELECTRON LITHIUS Pro-i
    描述
    ARF IMMERSION Track
    配置
    無配置
    OEM 代工型號說明
    The CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ーi is a 300mm process coater/developer that offers enhanced productivity and a significantly decreased footprint. It supports advanced immersion lithography through innovative modules and integrated metrology for advanced process control solutions. This platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership). In summary, the CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ーi is a highly efficient and cost-effective solution for advanced immersion lithography.
    文檔

    無文檔

    類別
    Coaters & Developers

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    127969


    晶圓尺寸:

    12"/300mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    TEL / TOKYO ELECTRON

    LITHIUS Pro-i

    verified-listing-icon
    已驗證
    類別
    Coaters & Developers
    上次驗證: 超過60天前
    listing-photo-3863c2dd4d414a0b87ed3cabcba44de8-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    127969


    晶圓尺寸:

    12"/300mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    ARF IMMERSION Track
    配置
    無配置
    OEM 代工型號說明
    The CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ーi is a 300mm process coater/developer that offers enhanced productivity and a significantly decreased footprint. It supports advanced immersion lithography through innovative modules and integrated metrology for advanced process control solutions. This platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership). In summary, the CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ーi is a highly efficient and cost-effective solution for advanced immersion lithography.
    文檔

    無文檔