描述
Develops Only 2. Controller: ACT Controller 3. Configuration: 4DEV 4. Stepper interface: No 5. Wafer Direction: RtoL 6. Accessory 6.1.AC Power Box 200V/100A 6.2.AC Power Cable: 3 phase 6.3.TCU 6.3.1. Model: INR-244-265B-2400 6.5.Chiller 6.5.1. Model: HCW 5,000-PR-NF-M 6.6.Chemical Cabinet (Qty): 1 7. Develop Units 7.1.Unit 2-1 7.1.1. Develop Nozzle Qty: 2 7.1.2. Develop Nozzle type: H nozzle 7.1.3. Develop Nozzle Move type: Horizontal 7.1.4. Top Rinse nozzle (Qty): 1 7.1.5. Bottom Rinse (Qty): 2 7.1.6. Developer Temp Control: Yes 7.1.7. Auto Damper: Yes 7.1.8. Auto Rinse: Yes 7.2.Unit 2-2 7.2.1. Develop Nozzle Qty: 2 7.2.2. Develop Nozzle type: H nozzle 7.2.3. Develop Nozzle Move type: Horizontal 7.2.4. Top Rinse nozzle (Qty): 1 7.2.5. Bottom Rinse (Qty): 2 7.2.6. Developer Temp Control: Yes 7.2.7. Auto Damper: Yes 7.2.8. Auto Rinse: Yes 7.3.Unit 2-3 7.3.1. Develop Nozzle Qty:2 7.3.2. Develop Nozzle type: H nozzle 7.3.3. Develop Nozzle Move type: Horizontal 7.3.4. Top Rinse nozzle (Qty): 1 7.3.5. Bottom Rinse (Qty): 2 7.3.6. Developer Temp Control: Yes 7.3.7. Auto Damper: Yes 7.3.8. Auto Rinse: Yes 7.4.Unit 2-4 7.4.1. Develop Nozzle Qty: 2 7.4.2. Develop Nozzle type: H nozzle 7.4.3. Develop Nozzle Move type: Horizontal 7.4.4. Top Rinse nozzle (Qty): 1 7.4.5. Bottom Rinse (Qty): 2 7.4.6. Developer Temp Control: Yes 7.4.7. Auto Damper: Yes 7.4.8. Auto Rinse: Yes 8. All Units (Qty) 8.1.Coater Units (Qty): 0 8.2.Develop Units (Qty):4 8.3.CHP Units (Qty):4 8.4.LHP Units (Qty): 6 8.5.HHP Units (Qty): 2 8.6.PHP Units (Qty): 0 8.7.CPL Units (Qty): 4 8.8.ADH Units (Qty):0 8.9.TRS Units (Qty):1 8.10.TCP Units (Qty): 1 8.11.WEE Units (Qty): 0 8.12.PEB Units (Qty): 0 8.13.FFB Units (Qty): 0 8.14.RDW Units (Qty): 0 8.15.IRA Block: No 8.16.CSB: No 8.17.CWH: No 8.18.CWD: No 8.19.TRS: No配置
Single Block 4DOEM 代工型號說明
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.文檔
無文檔
類別
Coaters & Developers
上次驗證: 今日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
146150
晶圓尺寸:
6"/150mm
年份:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ACT 8
類別
Coaters & Developers
上次驗證: 今日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
146150
晶圓尺寸:
6"/150mm
年份:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Develops Only 2. Controller: ACT Controller 3. Configuration: 4DEV 4. Stepper interface: No 5. Wafer Direction: RtoL 6. Accessory 6.1.AC Power Box 200V/100A 6.2.AC Power Cable: 3 phase 6.3.TCU 6.3.1. Model: INR-244-265B-2400 6.5.Chiller 6.5.1. Model: HCW 5,000-PR-NF-M 6.6.Chemical Cabinet (Qty): 1 7. Develop Units 7.1.Unit 2-1 7.1.1. Develop Nozzle Qty: 2 7.1.2. Develop Nozzle type: H nozzle 7.1.3. Develop Nozzle Move type: Horizontal 7.1.4. Top Rinse nozzle (Qty): 1 7.1.5. Bottom Rinse (Qty): 2 7.1.6. Developer Temp Control: Yes 7.1.7. Auto Damper: Yes 7.1.8. Auto Rinse: Yes 7.2.Unit 2-2 7.2.1. Develop Nozzle Qty: 2 7.2.2. Develop Nozzle type: H nozzle 7.2.3. Develop Nozzle Move type: Horizontal 7.2.4. Top Rinse nozzle (Qty): 1 7.2.5. Bottom Rinse (Qty): 2 7.2.6. Developer Temp Control: Yes 7.2.7. Auto Damper: Yes 7.2.8. Auto Rinse: Yes 7.3.Unit 2-3 7.3.1. Develop Nozzle Qty:2 7.3.2. Develop Nozzle type: H nozzle 7.3.3. Develop Nozzle Move type: Horizontal 7.3.4. Top Rinse nozzle (Qty): 1 7.3.5. Bottom Rinse (Qty): 2 7.3.6. Developer Temp Control: Yes 7.3.7. Auto Damper: Yes 7.3.8. Auto Rinse: Yes 7.4.Unit 2-4 7.4.1. Develop Nozzle Qty: 2 7.4.2. Develop Nozzle type: H nozzle 7.4.3. Develop Nozzle Move type: Horizontal 7.4.4. Top Rinse nozzle (Qty): 1 7.4.5. Bottom Rinse (Qty): 2 7.4.6. Developer Temp Control: Yes 7.4.7. Auto Damper: Yes 7.4.8. Auto Rinse: Yes 8. All Units (Qty) 8.1.Coater Units (Qty): 0 8.2.Develop Units (Qty):4 8.3.CHP Units (Qty):4 8.4.LHP Units (Qty): 6 8.5.HHP Units (Qty): 2 8.6.PHP Units (Qty): 0 8.7.CPL Units (Qty): 4 8.8.ADH Units (Qty):0 8.9.TRS Units (Qty):1 8.10.TCP Units (Qty): 1 8.11.WEE Units (Qty): 0 8.12.PEB Units (Qty): 0 8.13.FFB Units (Qty): 0 8.14.RDW Units (Qty): 0 8.15.IRA Block: No 8.16.CSB: No 8.17.CWH: No 8.18.CWD: No 8.19.TRS: No配置
Single Block 4DOEM 代工型號說明
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.文檔
無文檔