描述
Single Block (Resist Coater/Developer)配置
Tool is operating in clean room. Labelled as LEASE. Buyer will be responsible for arranging disassembly and rigging for tool. BLOCK DIAGRAM: Please see. Additional configurations will be provided. Pictures will be collected. Missing or damaged parts: Not reported. Please inspect to confirm.OEM 代工型號說明
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.文檔
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TEL / TOKYO ELECTRON
ACT 12
已驗證
類別
Coaters & Developers
上次驗證: 19 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
21309
晶圓尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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查看全部TEL / TOKYO ELECTRON
ACT 12
類別
Coaters & Developers
上次驗證: 19 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
21309
晶圓尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Single Block (Resist Coater/Developer)配置
Tool is operating in clean room. Labelled as LEASE. Buyer will be responsible for arranging disassembly and rigging for tool. BLOCK DIAGRAM: Please see. Additional configurations will be provided. Pictures will be collected. Missing or damaged parts: Not reported. Please inspect to confirm.OEM 代工型號說明
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.文檔
無文檔