描述
CD SEM配置
CD SEMOEM 代工型號說明
The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.文檔
無文檔
KLA
8250
已驗證
類別
CD-SEM
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
91285
晶圓尺寸:
8"/200mm
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
8250
已驗證
類別
CD-SEM
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
91285
晶圓尺寸:
8"/200mm
年份:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
CD SEM配置
CD SEMOEM 代工型號說明
The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.文檔
無文檔