跳到主要內容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 閱讀詳情

Moov logo

Moov Icon
KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
描述
無描述
配置
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
OEM 代工型號說明
未提供
文檔

無文檔

verified-listing-icon

已驗證

類別
CD-SEM

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

117151


晶圓尺寸:

未知


年份:

1999


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

8100XPR

verified-listing-icon
已驗證
類別
CD-SEM
上次驗證: 超過60天前
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/f2260899b822425c9a6163a2e8fe5aa7_686d7f194ed44493a92158e22571c89e1201a_mw.jpeg
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/7d3c16d75e6447459a9902cb4524ff88_15183797c5a549ffb9ee672fed5d30601201a_mw.jpeg
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/e4c5cb5a01f24d1da2d676438b9f3940_aec5c1be02ef4c698ed0b295acb2487b_mw.png
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/020d06e8769446a7b874bce829955102_040c9f8447814194bd5978a764d9cee1_mw.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

117151


晶圓尺寸:

未知


年份:

1999


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
OEM 代工型號說明
未提供
文檔

無文檔