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KLA 8100XPR
    描述
    無描述
    配置
    Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
    OEM 代工型號說明
    未提供
    文檔

    無文檔

    KLA

    8100XPR

    verified-listing-icon

    已驗證

    類別
    CD-SEM

    上次驗證: 9 天前

    關鍵商品詳情
    條件:

    Used

    作業狀態:

    未知

    產品編號:

    117151

    晶圓尺寸:

    未知

    年份:

    1999

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    KLA 8100XPR

    KLA

    8100XPR

    CD-SEM
    年份: 1999條件: 二手
    上次驗證9 天前

    KLA

    8100XPR

    verified-listing-icon
    已驗證
    類別
    CD-SEM
    上次驗證: 9 天前
    listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/f2260899b822425c9a6163a2e8fe5aa7_686d7f194ed44493a92158e22571c89e1201a_mw.jpeg
    listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/7d3c16d75e6447459a9902cb4524ff88_15183797c5a549ffb9ee672fed5d30601201a_mw.jpeg
    listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/e4c5cb5a01f24d1da2d676438b9f3940_aec5c1be02ef4c698ed0b295acb2487b_mw.png
    listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/020d06e8769446a7b874bce829955102_040c9f8447814194bd5978a764d9cee1_mw.png
    關鍵商品詳情
    條件:

    Used

    作業狀態:

    未知

    產品編號:

    117151

    晶圓尺寸:

    未知

    年份:

    1999

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
    OEM 代工型號說明
    未提供
    文檔

    無文檔

    類似上架商品
    查看全部
    KLA 8100XPR

    KLA

    8100XPR

    CD-SEM年份: 1999條件: 二手上次驗證:9 天前