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描述
無描述配置
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM 代工型號說明
The KLA-Tencor 8100XP CD SEM is a state-of-the-art scanning electron microscope used in semiconductor manufacturing. It enables precise and fast measurements of critical dimensions (CD) in small device geometries. The CD SEM has advanced capabilities for imaging and measuring high aspect ratio features, ensuring optimum device performance. It offers productivity-enhancing features such as high throughput, networking, offline recipe setup, and full system automation.文檔
無文檔
KLA
8100XP
類別
CD-SEM
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
117150
晶圓尺寸:
未知
年份:
2000
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Refurbishment Services
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描述
無描述配置
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM 代工型號說明
The KLA-Tencor 8100XP CD SEM is a state-of-the-art scanning electron microscope used in semiconductor manufacturing. It enables precise and fast measurements of critical dimensions (CD) in small device geometries. The CD SEM has advanced capabilities for imaging and measuring high aspect ratio features, ensuring optimum device performance. It offers productivity-enhancing features such as high throughput, networking, offline recipe setup, and full system automation.文檔
無文檔