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KLA 8100
  • KLA 8100
  • KLA 8100
  • KLA 8100
  • KLA 8100
  • KLA 8100
  • KLA 8100
描述
無描述
配置
Performance Specification: • Feature Size: < 100 nm • Resolution: < 4.5 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 40 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
OEM 代工型號說明
KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.
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verified-listing-icon

已驗證

類別
CD-SEM

上次驗證: 超過60天前

關鍵商品詳情

條件:

Refurbished


作業狀態:

未知


產品編號:

117149


晶圓尺寸:

未知


年份:

1998


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

8100

verified-listing-icon
已驗證
類別
CD-SEM
上次驗證: 超過60天前
listing-photo-cfd24c1e071744709b207b0d436346c8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/cfd24c1e071744709b207b0d436346c8/803fdaf49b81418d8dece860f64a0aaa_eaaab3e53a8943489606951150d7e255_mw.png
listing-photo-cfd24c1e071744709b207b0d436346c8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/cfd24c1e071744709b207b0d436346c8/07b1fe603f2a46ff98f649608cf03222_790f743805534a538a048ddae638b506_mw.png
listing-photo-cfd24c1e071744709b207b0d436346c8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/cfd24c1e071744709b207b0d436346c8/e1ff18caa6f740eeb273156b7896df24_1bd2a841e8494c4aa23a28d502abb8f5_mw.png
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listing-photo-cfd24c1e071744709b207b0d436346c8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/cfd24c1e071744709b207b0d436346c8/d4208141cb3f4334bc68d82a11d761a1_528af2e900a64f4e84aca9bb6413f64c1201a_mw.jpeg
listing-photo-cfd24c1e071744709b207b0d436346c8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/cfd24c1e071744709b207b0d436346c8/6f689cbd4b2a493f89d90dee64fde98b_7e26d6d741cd41b990bfb8fbbb4fc70e1201a_mw.jpeg
關鍵商品詳情

條件:

Refurbished


作業狀態:

未知


產品編號:

117149


晶圓尺寸:

未知


年份:

1998


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
Performance Specification: • Feature Size: < 100 nm • Resolution: < 4.5 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 40 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
OEM 代工型號說明
KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.
文檔

無文檔