描述
無描述配置
無配置OEM 代工型號說明
The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.文檔
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KLA
eCD-1
類別
CD-SEM
上次驗證: 13 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
126101
晶圓尺寸:
未知
年份:
未知
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描述
無描述配置
無配置OEM 代工型號說明
The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.文檔
無文檔