描述
The Gasonics L3510 plasma system is designed for ashing and cleaning semiconductor wafers. The Gasonics L3510 does this by creating monatomic oxygen the active specie, which chemically reacts with the photoresist on the surface of the wafer. The Gasonics L3510 system is composed of two main components: (1) The Process Sub-System The process sub-system includes the controller, microwave generator, gas flow control, cassette platform, and robot assembly. (2) The Vacuum Pump The vacuum pump is normally located in an adjacent equipment room separate from the main system. The pump should run continuously.配置
無配置OEM 代工型號說明
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.文檔
無文檔
LAM RESEARCH / NOVELLUS / GASONICS
L3510
已驗證
類別
Ashers
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
83989
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部
LAM RESEARCH / NOVELLUS / GASONICS
L3510
類別
Ashers
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
83989
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
The Gasonics L3510 plasma system is designed for ashing and cleaning semiconductor wafers. The Gasonics L3510 does this by creating monatomic oxygen the active specie, which chemically reacts with the photoresist on the surface of the wafer. The Gasonics L3510 system is composed of two main components: (1) The Process Sub-System The process sub-system includes the controller, microwave generator, gas flow control, cassette platform, and robot assembly. (2) The Vacuum Pump The vacuum pump is normally located in an adjacent equipment room separate from the main system. The pump should run continuously.配置
無配置OEM 代工型號說明
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.文檔
無文檔