描述
CDR E System One Stripper配置
無配置OEM 代工型號說明
The Matrix System One Model 105 Asher is a single chamber, automatic microprocessor-controlled photoresist stripper that is set up for 4″ – 6″ wafers. It is configured for up to 6″ wafers and has independent control of pressure, RF power, temperature, gas flow, & substrate position. The Matrix 105 Asher has a 600W RF water-cooled generator and a multi-step program (three steps + over etch) process program. It also has a “Butterfly” Valve for more precise pressure control and a phase magnitude detector to provide real-time RF impedance matching control. The Matrix 105 Asher has two Mass Flow Controllers and a Vacuum Hose Assembly. The range for Strip is 150C to 250C +/-5C and the range for Descum is 70C to 150C +/-5C. It also has a Wafer Lift Pin Assembly (up and down).文檔
無文檔
MATRIX
105
已驗證
類別
Ashers / Plasma Cleaner
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
104981
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MATRIX
105
類別
Ashers / Plasma Cleaner
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
104981
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
CDR E System One Stripper配置
無配置OEM 代工型號說明
The Matrix System One Model 105 Asher is a single chamber, automatic microprocessor-controlled photoresist stripper that is set up for 4″ – 6″ wafers. It is configured for up to 6″ wafers and has independent control of pressure, RF power, temperature, gas flow, & substrate position. The Matrix 105 Asher has a 600W RF water-cooled generator and a multi-step program (three steps + over etch) process program. It also has a “Butterfly” Valve for more precise pressure control and a phase magnitude detector to provide real-time RF impedance matching control. The Matrix 105 Asher has two Mass Flow Controllers and a Vacuum Hose Assembly. The range for Strip is 150C to 250C +/-5C and the range for Descum is 70C to 150C +/-5C. It also has a Wafer Lift Pin Assembly (up and down).文檔
無文檔