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LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
描述
Process: PR Strip 1. System Configuration: Main System Load Port: Brooks Fixload TM V6 EFEM Robot: 02-169208-00 Aligner: Yaskawa RF Rack: Generator ENI GHW-50A-04 5ea UI Panel Light Curtain: KEYENCE Signal Cable (RF Cable Included) 2. Process Chamber Configuration: GXT type (Upgrade Bell jar and Quartz tube) EPD: 4ea(#2,#3,#4,#5 Port) RF Matcher: CPMX-3000 5ea RF Source: 02-352103-00 5ea Load/Unload Port HDIS Pedestal: #2, #3, #,1, #6 Fixed Pedestal: #4, #5 Stage #1: Preheat Yaskawa Spindle Athenta Computer UI Computer Gate Valve: MDC ISO Valve Throttle Valve: NC Slit Valve: V-TEX Manometer: MKS 10 Torr Gas Box: MFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4
配置
無配置
OEM 代工型號說明
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
文檔

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類別
Ashers / Plasma Cleaner

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

81932


晶圓尺寸:

12"/300mm


年份:

2003


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS / GASONICS

GAMMA 2130

verified-listing-icon
已驗證
類別
Ashers / Plasma Cleaner
上次驗證: 超過60天前
listing-photo-8ac7579ef5c9481e944f428e72194a1e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

81932


晶圓尺寸:

12"/300mm


年份:

2003


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Process: PR Strip 1. System Configuration: Main System Load Port: Brooks Fixload TM V6 EFEM Robot: 02-169208-00 Aligner: Yaskawa RF Rack: Generator ENI GHW-50A-04 5ea UI Panel Light Curtain: KEYENCE Signal Cable (RF Cable Included) 2. Process Chamber Configuration: GXT type (Upgrade Bell jar and Quartz tube) EPD: 4ea(#2,#3,#4,#5 Port) RF Matcher: CPMX-3000 5ea RF Source: 02-352103-00 5ea Load/Unload Port HDIS Pedestal: #2, #3, #,1, #6 Fixed Pedestal: #4, #5 Stage #1: Preheat Yaskawa Spindle Athenta Computer UI Computer Gate Valve: MDC ISO Valve Throttle Valve: NC Slit Valve: V-TEX Manometer: MKS 10 Torr Gas Box: MFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4
配置
無配置
OEM 代工型號說明
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
文檔

無文檔