描述
System controller (AI/O board, DI/O board) RF generator rack (RF bias generator, RF source generator) Process chamber (RF bias matcher)配置
IRIDIAOEM 代工型號說明
The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.文檔
無文檔
LAM RESEARCH / NOVELLUS / GASONICS
PEP IRIDIA
已驗證
類別
Ashers / Plasma Cleaner
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
92131
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH / NOVELLUS / GASONICS
PEP IRIDIA
類別
Ashers / Plasma Cleaner
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
92131
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
System controller (AI/O board, DI/O board) RF generator rack (RF bias generator, RF source generator) Process chamber (RF bias matcher)配置
IRIDIAOEM 代工型號說明
The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.文檔
無文檔