We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 閱讀詳情
描述
無描述配置
Main Body- Wooden H261×W151×D220cm, 1000kgOEM 代工型號說明
The FusionGemini Plasma Asher ES (Enhanced Strip) is a device designed for advanced IC manufacturing. It eliminates the need for “wet” chemical processing to remove post-strip residues, providing a “dry” solution through the use of specialized gas chemistries. This results in dry strip processes that only require a follow-on DI water rinse. The FusionGemini ES can perform resist strip and residue removal in the same chamber, providing high throughput and rapid parallel processing. It also provides the lowest damage of any residue removal-capable plasma asher in the industry, and uses radiant heating for multi-temperature stripping. The FusionGemini ES uses O2, H2:N2, CF4, and custom gases, and is a 200mm photoresist strip system.文檔
無文檔
類別
Ashers / Plasma Cleaner
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
94891
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AXCELIS / FUSION
GEMINI ES
類別
Ashers / Plasma Cleaner
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
94891
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Main Body- Wooden H261×W151×D220cm, 1000kgOEM 代工型號說明
The FusionGemini Plasma Asher ES (Enhanced Strip) is a device designed for advanced IC manufacturing. It eliminates the need for “wet” chemical processing to remove post-strip residues, providing a “dry” solution through the use of specialized gas chemistries. This results in dry strip processes that only require a follow-on DI water rinse. The FusionGemini ES can perform resist strip and residue removal in the same chamber, providing high throughput and rapid parallel processing. It also provides the lowest damage of any residue removal-capable plasma asher in the industry, and uses radiant heating for multi-temperature stripping. The FusionGemini ES uses O2, H2:N2, CF4, and custom gases, and is a 200mm photoresist strip system.文檔
無文檔