描述
SUNALE R-150 standard ALD system with four separate inlets for precursor sources. Maximum deposition temperature for the ALD reactor is 500C RC-150 reaction chamber with KF/CF connection flanges SH-150 sample holder for maximum 6" wafer Touch panel PC and elctronics for operating the ALD reactor with multi-source ALD software Precursor sources for handling solid, liquid, and gas precursors Picosolution source system: Cooled source system for high vapor pressure liquid precursors(eg. TMA, DEZ, TiCl4, and H2O) Picosolution Booster source system: heated source- up to 200C for ultra-low pressure metal precursors (eg. for TEMAHf, TEMAZr) POCA-150 powder coater chamber: Flow thru static bed cartridge assembly for coating powder substrate materials Edwards E2M80 2 stage 57CFM vacuum pump serial no. 1517D57R05362 Power: 230v, 3 phase配置
SUNALE™ R-150 Standard ALD System The ALD reactor has four separate inlets for precursor sources. It can accommodate up to five precursor sources. Maximum deposition temperature of the ALD reactor is 500 C.OEM 代工型號說明
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PICOSUN
SUNALE R-150
已驗證
類別
ALD
上次驗證: 8 天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled / Uncrated
產品編號:
116613
晶圓尺寸:
6"/150mm
年份:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PICOSUN
SUNALE R-150
類別
ALD
上次驗證: 8 天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled / Uncrated
產品編號:
116613
晶圓尺寸:
6"/150mm
年份:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
SUNALE R-150 standard ALD system with four separate inlets for precursor sources. Maximum deposition temperature for the ALD reactor is 500C RC-150 reaction chamber with KF/CF connection flanges SH-150 sample holder for maximum 6" wafer Touch panel PC and elctronics for operating the ALD reactor with multi-source ALD software Precursor sources for handling solid, liquid, and gas precursors Picosolution source system: Cooled source system for high vapor pressure liquid precursors(eg. TMA, DEZ, TiCl4, and H2O) Picosolution Booster source system: heated source- up to 200C for ultra-low pressure metal precursors (eg. for TEMAHf, TEMAZr) POCA-150 powder coater chamber: Flow thru static bed cartridge assembly for coating powder substrate materials Edwards E2M80 2 stage 57CFM vacuum pump serial no. 1517D57R05362 Power: 230v, 3 phase配置
SUNALE™ R-150 Standard ALD System The ALD reactor has four separate inlets for precursor sources. It can accommodate up to five precursor sources. Maximum deposition temperature of the ALD reactor is 500 C.OEM 代工型號說明
未提供文檔
無文檔