跳到主要內容

We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 閱讀詳情

Messages

VIEW ALL MESSAGES

Messages

listing-image-

Messages including contact info may not be shared. We scan, review, and reserve the right to remove sensitive information from all messages to prevent fraud and policy violations.All messages subject to review, review our policy for more info.

AIXTRON / GENUS StrataGem 200

描述

無描述

配置

HfO2 deposition: − Temperature: 320 ºC − Pressure: 0.5 Torr − Precursor: TEMAH (Tetrakisethymethyllaminohafnium) − Precursor carrier gas: Ar − Process purge gas: Ar − HfO2 reaction: TEMAH half-reaction + O3 half-reaction Al2O3 deposition: − Temperature: 250 ºC − Pressure: 0.5 Torr − Precursor: TMA (Trimethylaluminum) − Precursor carrier gas: Ar − Process purge gas: Ar − Al2O3 reaction: TMA half-reaction + O3 half-reaction TiN deposition: − Temperature: 470 ºC − Pressure: 0.8 Torr − Precursor: TiCl4 (Titanium tetrachloride) − Precursor carrier gas: Ar − Process purge gas: Ar − TiN reaction: TiCl4 half-reaction + NH3 half-reaction

OEM 代工型號說明

未提供

文檔

無文檔

AIXTRON / GENUS

StrataGem 200

已驗證

類別

ALD

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used

作業狀態:

Installed / Running

產品編號:

104535

晶圓尺寸:

8"/200mm

年份:

2010

Have Additional Questions?

Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

類似上架商品

AIXTRON / GENUS StrataGem 200

AIXTRON / GENUS

StrataGem 200

年份: 2010條件: 二手

上次驗證超過60天前

AIXTRON / GENUS

StrataGem 200

verified-listing-icon

已驗證

類別

ALD

上次驗證: 超過60天前

listing-photo-ce42bfa90d314e52bd43a58fd17612e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76223/ce42bfa90d314e52bd43a58fd17612e5/f8697c43178d46bfba54d4345b305921_s84852969_mw.jpg

listing-photo-ce42bfa90d314e52bd43a58fd17612e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76223/ce42bfa90d314e52bd43a58fd17612e5/c7abc9732368422cb44aa6bfd2f0229a_s84852974_mw.jpg

listing-photo-ce42bfa90d314e52bd43a58fd17612e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76223/ce42bfa90d314e52bd43a58fd17612e5/fcb40d2be82d44d9aa0a58b4ab9d64bd_s84852971_mw.jpg

listing-photo-ce42bfa90d314e52bd43a58fd17612e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76223/ce42bfa90d314e52bd43a58fd17612e5/ed4542bbd97c4db7ab07728dbd29dfb8_s84852972_mw.jpg

listing-photo-ce42bfa90d314e52bd43a58fd17612e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76223/ce42bfa90d314e52bd43a58fd17612e5/9e9a513d8c4b4764b38cd9d74371da83_s84852973_mw.jpg

listing-photo-ce42bfa90d314e52bd43a58fd17612e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76223/ce42bfa90d314e52bd43a58fd17612e5/19683b5246164cf29f94942faf611716_s51364380_mw.jpg

關鍵商品詳情

條件:

Used

作業狀態:

Installed / Running

產品編號:

104535

晶圓尺寸:

8"/200mm

年份:

2010

Have Additional Questions?

Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

描述

無描述

配置

HfO2 deposition: − Temperature: 320 ºC − Pressure: 0.5 Torr − Precursor: TEMAH (Tetrakisethymethyllaminohafnium) − Precursor carrier gas: Ar − Process purge gas: Ar − HfO2 reaction: TEMAH half-reaction + O3 half-reaction Al2O3 deposition: − Temperature: 250 ºC − Pressure: 0.5 Torr − Precursor: TMA (Trimethylaluminum) − Precursor carrier gas: Ar − Process purge gas: Ar − Al2O3 reaction: TMA half-reaction + O3 half-reaction TiN deposition: − Temperature: 470 ºC − Pressure: 0.8 Torr − Precursor: TiCl4 (Titanium tetrachloride) − Precursor carrier gas: Ar − Process purge gas: Ar − TiN reaction: TiCl4 half-reaction + NH3 half-reaction

OEM 代工型號說明

未提供

文檔

無文檔

類似上架商品

AIXTRON / GENUS StrataGem 200

AIXTRON / GENUS

StrataGem 200

ALD年份: 2010條件: 二手上次驗證:超過60天前