描述
Lithography Stepper配置
- DUV Scanner: 8" - Reticle size: 6" - NA: 0.68 - Light Source: KRF Excimer Laser CYMER ELS5400 - Reduction Ratio: 1:4 - Field: 22 mm X 33 mm - Wafer Loader Type 3 - Resolution: 180 nm - Temperature controller - Loader controller (WL/RL) - PCB Controller rack - Isolation transformer - Standard BMU PPD - Bar code readerOEM 代工型號說明
Stepper. NSR-S203B (resolution ≦ 180 nm). Ability to mass manufacture ICs with ultra-high-precision circuitry–specifically, sub-0.18µm minimum-pattern linewidth.文檔
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NIKON
NSR-S203B
已驗證
類別
248nm DUV
上次驗證: 17 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
103937
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NSR-S203B
類別
248nm DUV
上次驗證: 17 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
103937
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Lithography Stepper配置
- DUV Scanner: 8" - Reticle size: 6" - NA: 0.68 - Light Source: KRF Excimer Laser CYMER ELS5400 - Reduction Ratio: 1:4 - Field: 22 mm X 33 mm - Wafer Loader Type 3 - Resolution: 180 nm - Temperature controller - Loader controller (WL/RL) - PCB Controller rack - Isolation transformer - Standard BMU PPD - Bar code readerOEM 代工型號說明
Stepper. NSR-S203B (resolution ≦ 180 nm). Ability to mass manufacture ICs with ultra-high-precision circuitry–specifically, sub-0.18µm minimum-pattern linewidth.文檔
無文檔