描述
無描述配置
無配置OEM 代工型號說明
The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.文檔
無文檔
ASML
TWINSCAN XT:1400F
已驗證
類別
193 nm Step and Scan
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
90829
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1400F
類別
193 nm Step and Scan
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
90829
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.文檔
無文檔