Xradia 510 Versa breaks the one-micron resolution barrier for 3D imaging and in situ / 4D investigations. ZEISS Xradia 510 Versa makes synchrotron-caliber research even more practical for mid-sized imaging centers and industrial laboratories. Benefit from the two-stage magnification technique offered by ZEISS Xradia Versa to uniquely achieve RaaD, which enables you to effectively study the widest range of sample sizes. Intuitive Scout-and-Scan control software enables a broad range of user skillsets in your busy lab.

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

XRADIA 510 VERSA

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