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TEL / TOKYO ELECTRON UW-200Z
    描述
    Batch Wafer Processing
    配置
    無配置
    OEM 代工型號說明
    The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.
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    TEL / TOKYO ELECTRON

    UW-200Z

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    已驗證

    類別

    Wet processing
    上次驗證: 19 天前
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    52997


    晶圓尺寸:

    8"/200mm


    年份:

    2003

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    TEL / TOKYO ELECTRON UW-200Z
    TEL / TOKYO ELECTRONUW-200ZWet processing
    年份: 2003條件: 二手
    上次驗證19 天前

    TEL / TOKYO ELECTRON

    UW-200Z

    verified-listing-icon

    已驗證

    類別

    Wet processing
    上次驗證: 19 天前
    listing-photo-f70a89999e17457a82ac1554f0f746b5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    52997


    晶圓尺寸:

    8"/200mm


    年份:

    2003


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Batch Wafer Processing
    配置
    無配置
    OEM 代工型號說明
    The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.
    文檔

    無文檔

    類似上架商品
    查看全部
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