描述
無描述配置
PROCESS: HF, NOE etch Citric POU SD2 DryerOEM 代工型號說明
The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.文檔
無文檔
TEL / TOKYO ELECTRON
UW-200Z
已驗證
類別
Wet processing
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
36805
晶圓尺寸:
未知
年份:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
UW-200Z
已驗證
類別
Wet processing
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
36805
晶圓尺寸:
未知
年份:
2005
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
PROCESS: HF, NOE etch Citric POU SD2 DryerOEM 代工型號說明
The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.文檔
無文檔