概述

The Models SCSx124 and SCSx126 are highly efficient cleaning systems designed for Photomasks, Wafers, and Substrates, particularly suitable for submicron cleaning. These systems are recognized for their reliability and cost-effectiveness, leveraging a proven assortment of cleaning technologies. They offer versatile configuration options, including Atomizing Mist Nozzle, Brushes, Megasonic Nozzles & Pies, High Pressure Deionized (DI) water, among others, to cater to different cleaning requirements. Furthermore, they feature a rapid and effective drying technique that utilizes variable spin speeds, ensuring thorough and efficient drying of the cleaned items.