描述
Substrate Cleaning System配置
無配置OEM 代工型號說明
The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.文檔
無文檔
ULTRA-T EQUIPMENT / UTE
SCSe124
已驗證
類別
Wafer Scrubber
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
78197
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULTRA-T EQUIPMENT / UTE
SCSe124
類別
Wafer Scrubber
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
78197
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Substrate Cleaning System配置
無配置OEM 代工型號說明
The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.文檔
無文檔