概述

The Atlas II is an advanced 300mm metrology system from Nanometrics, designed for high-performance process control metrology. It incorporates innovations in optical components, precision wafer positioning, and new software analysis to enable measurements of the smallest semiconductor design features, including complex device structures at 1x nm technology nodes. The system provides unprecedented stability in focus performance, allowing precise and repeatable measurements of critical device features. It is capable of on-device measurement, eliminating the need for scribe-line marks and enabling direct and reliable process control of device manufacturing. The Atlas II also offers a doubling of wafer throughput and significant improvement in wafer positioning precision, lowering the system’s cost of ownership. It is compatible with Nanometrics’ Lynx cluster metrology platform and can be configured with Spectroscopic reflectometer (SR) and Spectroscopic ellipsometer (SE) metrology modules, with optional additions such as NanoCD Suite for OCD and wafer stress/bow.