概述

The SpectraFilm LD10 system utilizes a laser-driven plasma light source to produce reliable, high-precision film measurements for a broad range of film layers, including the thin, multilayer film stacks used in forming complex device structures such as FinFETs. An infrared-based subsystem on the SpectraFilm LD10 enables characterization of thick films and film stacks, such as those found in 3D NAND flash devices.